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What is Process Parameters

Data-Driven Optimization of Manufacturing Processes
These are the factors which affect a process such as PVD.
Published in Chapter:
Progress in Optimization of Physical Vapor Deposition of Thin Films
Fredrick M. Mwema (University of Johannesburg, South Africa), Esther T. Akinlabi (Pan African University for Life and Earth Sciences Institute (PAULESI), Ibadan, Nigeria), and Oluseyi Philip Oladijo (Botswana International University of Science and Technology, Botswana)
Copyright: © 2021 |Pages: 17
DOI: 10.4018/978-1-7998-7206-1.ch015
Abstract
In this chapter, the current state of the art in optimization of thin film deposition processes is discussed. Based on the reliable and credible published results, the study aims to identify the applications of various optimization techniques in the thin film deposition processes, with emphasis on physical deposition methods. These methods are chosen due to their attractive attributes over chemical deposition techniques for thin film manufacturing. The study identifies the critical parameters and factors, which are significant in designing of the optimization algorithms based on the specific deposition methods. Based on the specific optimization studies, the chapter provides general trends, optimization evaluation criteria, and input-output parameter relationships on thin film deposition. Research gaps and directions for future studies on optimization of physical vapor deposition methods for thin film manufacturing are provided.
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